C3100 – Ring Framed Wafer CO2 Cleaning System

(C3100) Ring Framed Wafer CO2 Cleaning System

  • Automatic ring framed wafer cleaner
  • The system removes the contaminants on the wafer.
  • All processes are automated through the cassette loading-unloading system.
  • Stand alone cleaner
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Description

Specifications

M/C Type Cassette loading / Automatic cleaning / Dual cleaning chambers
Cleaning Target Glass / ISM / TSV Wafers(~12”) with ring frame
CO2 Jet Cleaner SM201 / S201 / SS201 (selectable)
Cleaning Mode Spinning
Cleaning Area Max. 300mm in diameter
Dimension 2000L x 1700W x 1900H mm
Utilities 220VAC, 50/60Hz, 1 Phase, 20A
CDA : 5~8kg/cm²
Options Suction Unit / ULPA filter

Applications